Ιδρυματικό Αποθετήριο
Πολυτεχνείο Κρήτης
Πολυτεχνείο Κρήτης
EN
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| URI: | http://purl.tuc.gr/dl/dias/608032BD-A140-4F5F-8A4A-FAAAEE2FA9BE | ||
| Έτος | 1998 | ||
| Τύπος | Δημοσίευση σε Περιοδικό με Κριτές | ||
| Άδεια Χρήσης |
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| Βιβλιογραφική Αναφορά | N. Kallithrakas-Kontos, R. Moshohoritou, V. Ninni and I. Tsangaraki-Kaplanoglou, "Investigation of the relationship between the reflectance and the deposited nickel and tin amount on the aluminium anodic oxide film," Thin Solid Films, vol. 326, no. 1-2, pp. 166–170, Aug. 1998. doi: 10.1016/S0040-6090(98)00569-0 https://doi.org/10.1016/S0040-6090(98)00569-0 | ||
| Εμφανίζεται στις Συλλογές |
Two distinct methods were used, energy dispersive X-ray fluorescence and specular reflectance measurement, in order to analyze the amount of the nickel and tin layers on anodic aluminium surfaces. These metals were electroplated at the bottom of the pores of anodized aluminium, during electrolytic colouring in solutions containing nickel borate and boric acid, tin sulphate and sulphuric acid, respectively. An exponential relation was derived giving the absorbance of each sample as a function of the surface density of the deposited metal. Various organic additives that improve the efficiency of the electrolytic procedure were used as well as AC or DC current which affects the situation of the anodic film; their influence on the calculated parameters was also investigated.
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